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PAD loves NY
Consolidating its position on the American East Coast, PAD System has moved to a larger, permanent New York office at 1400 Broadway Street.
Since the official opening in the Big Apple in September 2004, PAD has offered service assistance and also organized numerous demos, training fairs and seminars in this important American apparel industry centre. The most recent events in New York were two major PAD seminars offered this summer at Xincon Technology School and at Fashion Institute of Technology (FIT).
These conferences, as well as the other events such as Benchmark Time Studies, will be held in New York on a regular basis. For more details, just follow our news online!
RE: PAD System™ at New Delhi’s Garmentech International 2004
Montréal, Canada, June 29, 2004 — PAD System™ Technologies Inc., world renowned CAD/CAM developer for the fashion industry, will unveil their latest technology at Garmentech International 2004, in New Delhi, India.
Reaffirming their commitment to manufacturers in India, Pad System™ will be joining forces with its Indian distributor, Apparel & Leather Technics Limited, to present its latest software solutions for this rapidly growing market.
According to the World Trade Organisation, India is now one of the top 10 clothing exporters in the world, with $5.5 billion US in exports representing 2.8% of global exports for this sector. Cynthia Chapdelaine, International Sales Representative for PAD, will be travelling to India for the 5th time in the past 18 months and is more excited than ever about her upcoming trip: “It’s so exciting to witness and contribute to these important global changes. The world is evolving at such a fast pace and PAD is right up there, paving the way.”
In fact, the growing demand for apparel manufacturing in India, along with the need for plant modernization, has translated into a drastic increase in interest for PAD technology. Since many leading players in the Indian industry are making the switch to CAD/CAM for the first time, they are genuinely pleased to have access to flexible, efficient, easy-to-use solutions that are quickly integrated and easily learned. Developing and delivering this type of solution is not only PAD’s strength, it is an integral part of its Mission.
At the show, PAD will not only showcase the latest features of its world renowned CAD/CAM Pattern Design, Marker Making, Plotting, Production Management and 3D Visualization Software, the Company will also introduce its new textile design modules for the creation of printed, woven, and knit fabrics: 4D Box Hi-Print, Hi-Tex and Hi-Knit.
About Garmentech International 2004
Now in its 5th year, Garmentech International 2004 has developed into the premier international apparel and knitting technology trade show in India. It is the ideal platform for the Indian apparel industry to update and upgrade their technology.
The show is reserved for business visitors only and, in addition to CAD/CAM systems and support services, the show will feature exhibits from a variety of manufacturers, distributors, agents and dealers from industries such as: sewing machinery, laundry machinery, finishing machinery, knitting machinery, embroidery machinery, fabrics, allied materials, trimmings, accessories, etc.
About Pad
Established over a decade and a half ago, Pad System™ has continuously distinguished itself as a leader in the sewn product industry by providing innovative and effective CAD/CAM technology solutions. Today, PAD System™ products are distributed in more than 50 countries on all five continents, providing leading-edge solutions to over 10,000 users worldwide, including many industry leaders. The international appeal of PAD solutions has generated translations into more than 15 languages.
For more information about PAD, visit the other sections of our web site or Contact us!
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News - 2004